| Liquid immersion deep-ultraviolet interferometric lithography JA Hoffnagle, WD Hinsberg, M Sanchez, FA Houle Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999 | 687 | 1999 |
| Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance W Hinsberg, FA Houle, J Hoffnagle, M Sanchez, G Wallraff, M Morrison, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998 | 219 | 1998 |
| Modeling line edge roughness effects in sub 100 nanometer gate length devices P Oldiges, Q Lin, K Petrillo, M Sanchez, M Ieong, M Hargrove 2000 International Conference on Simulation Semiconductor Processes and …, 2000 | 207 | 2000 |
| Nanoporous polyimides derived from highly fluorinated polyimide/poly (propylene oxide) copolymers KR Carter, RA DiPietro, MI Sanchez, SA Swanson Chemistry of materials 13 (1), 213-221, 2000 | 183 | 2000 |
| Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists WD Hinsberg, FA Houle, MI Sanchez, GM Wallraff IBM Journal of Research and Development 45 (5), 667-682, 2001 | 175 | 2001 |
| Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist FA Houle, WD Hinsberg, M Morrison, MI Sanchez, G Wallraff, C Larson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 158 | 2000 |
| Polyimides derived from nonaromatic monomers: Synthesis, characterization and potential applications W Volksen, HJ Cha, MI Sanchez, DY Yoon Reactive and Functional Polymers 30 (1-3), 61-69, 1996 | 123 | 1996 |
| Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns CV Nguyen, RMD Stevens, J Barber, J Han, M Meyyappan, MI Sanchez, ... Applied Physics Letters 81 (5), 901-903, 2002 | 99 | 2002 |
| Effect of resist components on image spreading during postexposure bake of chemically amplified resists WD Hinsberg, FA Houle, MI Sanchez, ME Morrison, GM Wallraff, ... Advances in Resist Technology and Processing XVII 3999, 148-160, 2000 | 94 | 2000 |
| Aerial image contrast using interferometric lithography: effect on line-edge roughness MI Sanchez, WD Hinsberg, FA Houle, JA Hoffnagle, H Ito, CV Nguyen Advances in Resist Technology and Processing XVI 3678, 160-171, 1999 | 94 | 1999 |
| Extendibility of chemically amplified resists: another brick wall? WD Hinsberg, FA Houle, MI Sanchez, JA Hoffnagle, GM Wallraff, ... Advances in Resist Technology and Processing XX 5039, 1-14, 2003 | 91 | 2003 |
| Fast model-based optical proximity correction AE Rosenbluth, GM Gallatin, RL Gordon, N Seong, AY Lvov, ... US Patent 7,079,223, 2006 | 90 | 2006 |
| High-temperature polyimide nanofoams for microelectronic applications JL Hedrick, KR Carter, HJ Cha, CJ Hawker, RA DiPietro, JW Labadie, ... Reactive and Functional polymers 30 (1-3), 43-53, 1996 | 89 | 1996 |
| Liquid immersion lithography: evaluation of resist issues W Hinsberg, GM Wallraff, CE Larson, BW Davis, V Deline, S Raoux, ... Advances in Resist Technology and Processing XXI 5376, 21-33, 2004 | 82 | 2004 |
| Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist FA Houle, WD Hinsberg, MI Sanchez, JA Hoffnagle Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 78 | 2002 |
| Kinetic model for positive tone resist dissolution and roughening FA Houle, WD Hinsberg, MI Sanchez Macromolecules 35 (22), 8591-8600, 2002 | 73 | 2002 |
| Polyimide nanofoams based on ordered polyimides derived from poly (amic alkyl esters): PMDA/4-BDAF KR Carter, RA DiPietro, MI Sanchez, TP Russell, P Lakshmanan, ... Chemistry of materials 9 (1), 105-118, 1997 | 71 | 1997 |
| High-NA lithographic imagery at Brewster's angle TA Brunner, N Seong, WD Hinsberg, JA Hoffnagle, FA Houle, MI Sanchez Optical Microlithography XV 4691, 1-10, 2002 | 67 | 2002 |
| Method of measuring the spatial resolution of a photoresist JA Hoffnagle, WD Hinsberg, MI Sanchez, FA Houle Optics letters 27 (20), 1776-1778, 2002 | 51 | 2002 |
| Polyimide nanofoams from caprolactone-based copolymers JL Hedrick, TP Russell, M Sanchez, R DiPietro, S Swanson, ... Macromolecules 29 (10), 3642-3646, 1996 | 49 | 1996 |
