Peter van der Walle
Peter van der Walle
Optical engineer, TNO
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Cited by
Cited by
Quantum control experiment reveals solvation-induced decoherence
P Van der Walle, MTW Milder, L Kuipers, JL Herek
Proceedings of the National Academy of Sciences 106 (19), 7714-7717, 2009
Compact high-resolution spectral phase shaper
S Postma, P van der Walle, HL Offerhaus, NF van Hulst
Review of scientific instruments 76 (12), 2005
Exploring, tailoring, and traversing the solution landscape of a phase-shaped CARS process
ACW van Rhijn, HL Offerhaus, P van der Walle, JL Herek, A Jafarpour
Optics express 18 (3), 2695-2709, 2010
Evolution strategies for laser pulse compression
R Fanciulli, L Willmes, J Savolainen, P Van Der Walle, T Bäck, JL Herek
Artificial Evolution: 8th International Conference, Evolution Artificielle …, 2008
High speed low power optical detection of sub-wavelength scatterer
S Roy, M Bouwens, L Wei, SF Pereira, HP Urbach, P Van Der Walle
Review of Scientific Instruments 86 (12), 2015
EBL2: high power EUV exposure facility
E te Sligte, N Koster, F Molkenboer, P van der Walle, P Muilwijk, ...
Photomask Technology 2016 9985, 259-266, 2016
Tailoring a coherent control solution landscape by linear transforms of spectral phase basis
P van der Walle, H Offerhaus, J Herek, A Jafarpour
Optics express 18 (2), 973-987, 2010
Robust orthogonal parameterization of evolution strategy for adaptive laser pulse shaping
A Jafarpour, J Savolainen, R de Jong, J Middag, DP Sprünken, ...
Optics express 17 (14), 11986-12000, 2009
Implementation of background scattering variance reduction on the Rapid Nano particle scanner
P van der Walle, S Hannemann, D van Eijk, W Mulckhuyse, ...
Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014
Information carrier, and system for positioning such an information carrier in an apparatus
RFM Hendriks, TJ De Hoog, P Van Der Walle
US Patent 7,433,255, 2008
First light and results on EBL2
N Koster, E te Sligte, A Deutz, F Molkenboer, P Muilwijk, P van der Walle, ...
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation …, 2017
Deep sub-wavelength metrology for advanced defect classification
P van der Walle, E Kramer, JCJ van der Donck, W Mulckhuyse, L Nijsten, ...
Optical Measurement Systems for Industrial Inspection X 10329, 1137-1146, 2017
Particle detection on flat surfaces
J Van der Donck, R Snel, J Stortelder, A Abutan, S Oostrom, S Van Reek, ...
Extreme Ultraviolet (EUV) Lithography II 7969, 618-624, 2011
First light at EBL2
N Koster, E te Sligte, F Molkenboer, A Deutz, P van der Walle, P Muilwijk, ...
Extreme Ultraviolet (EUV) Lithography VIII 10143, 338-344, 2017
Investigating the intrinsic cleanliness of automated handling designed for EUV mask pod-in-pod systems
O Brux, P van der Walle, JCJ van der Donck, P Dress
Photomask Technology 2011 8166, 737-745, 2011
Increased particle inspection sensitivity by reduction of background scatter variance
P Van der Walle, P Kumar, D Ityaksov, R Versluis, DJ Maas, O Kievit, ...
Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013
Particle qualification procedure for the TNO EUV reticle load port module of the HamaTech MaskTrackPro cleaning tool
JK Stortelder, JCJ Van der Donck, S Oostrom, P Van der Walle, O Brux, ...
Extreme Ultraviolet (EUV) Lithography II 7969, 597-606, 2011
Enhancing re-detection efficacy of defects on blank wafers using stealth fiducial markers
MAJ Bouwens, DJ Maas, JCJ van der Donck, PFA Alkemade, ...
Microelectronic Engineering 153, 48-54, 2016
RapidNano: Towards 20nm Particle Detection on EUV Mask Blanks
J van der Donck, P Bussink, E Fritz, P van der Walle
Nanoparticle detection limits of TNO’s Rapid Nano: modeling and experimental results
P van der Walle, P Kumar, D Ityaksov, R Versluis, DJ Maas, O Kievit, ...
Photomask technology 2012, 85222Q, 2012
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