Quantum control experiment reveals solvation-induced decoherence P Van der Walle, MTW Milder, L Kuipers, JL Herek Proceedings of the National Academy of Sciences 106 (19), 7714-7717, 2009 | 43 | 2009 |
High speed low power optical detection of sub-wavelength scatterer S Roy, M Bouwens, L Wei, SF Pereira, HP Urbach, P Van Der Walle Review of Scientific Instruments 86 (12), 2015 | 18 | 2015 |
Compact high-resolution spectral phase shaper S Postma, P van der Walle, HL Offerhaus, NF van Hulst Review of scientific instruments 76 (12), 2005 | 18 | 2005 |
Exploring, tailoring, and traversing the solution landscape of a phase-shaped CARS process ACW van Rhijn, HL Offerhaus, P van der Walle, JL Herek, A Jafarpour Optics express 18 (3), 2695-2709, 2010 | 17 | 2010 |
Evolution strategies for laser pulse compression R Fanciulli, L Willmes, J Savolainen, P Van Der Walle, T Bäck, JL Herek Artificial Evolution: 8th International Conference, Evolution Artificielle …, 2008 | 17 | 2008 |
EBL2: high power EUV exposure facility E te Sligte, N Koster, F Molkenboer, P van der Walle, P Muilwijk, ... Photomask Technology 2016 9985, 259-266, 2016 | 12 | 2016 |
Tailoring a coherent control solution landscape by linear transforms of spectral phase basis P van der Walle, H Offerhaus, J Herek, A Jafarpour Optics express 18 (2), 973-987, 2010 | 12 | 2010 |
Robust orthogonal parameterization of evolution strategy for adaptive laser pulse shaping A Jafarpour, J Savolainen, R de Jong, J Middag, DP Sprünken, P Walle, ... Optics express 17 (14), 11986-12000, 2009 | 11 | 2009 |
Implementation of background scattering variance reduction on the Rapid Nano particle scanner P van der Walle, S Hannemann, D van Eijk, W Mulckhuyse, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 10 | 2014 |
Information carrier, and system for positioning such an information carrier in an apparatus RFM Hendriks, TJ De Hoog, P Van Der Walle US Patent 7,433,255, 2008 | 10 | 2008 |
First light and results on EBL2 N Koster, E te Sligte, A Deutz, F Molkenboer, P Muilwijk, P van der Walle, ... Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation …, 2017 | 7 | 2017 |
Deep sub-wavelength metrology for advanced defect classification P van der Walle, E Kramer, JCJ van der Donck, W Mulckhuyse, L Nijsten, ... Optical Measurement Systems for Industrial Inspection X 10329, 1137-1146, 2017 | 7 | 2017 |
Particle detection on flat surfaces J Van der Donck, R Snel, J Stortelder, A Abutan, S Oostrom, S Van Reek, ... Extreme Ultraviolet (EUV) Lithography II 7969, 618-624, 2011 | 7 | 2011 |
First light at EBL2 N Koster, E te Sligte, F Molkenboer, A Deutz, P van der Walle, P Muilwijk, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 338-344, 2017 | 6 | 2017 |
Investigating the intrinsic cleanliness of automated handling designed for EUV mask pod-in-pod systems O Brux, P van der Walle, JCJ van der Donck, P Dress Photomask Technology 2011 8166, 737-745, 2011 | 6 | 2011 |
Increased particle inspection sensitivity by reduction of background scatter variance P Van der Walle, P Kumar, D Ityaksov, R Versluis, DJ Maas, O Kievit, ... Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 5 | 2013 |
Particle qualification procedure for the TNO EUV reticle load port module of the HamaTech MaskTrackPro cleaning tool JK Stortelder, JCJ Van der Donck, S Oostrom, P Van der Walle, O Brux, ... Extreme Ultraviolet (EUV) Lithography II 7969, 597-606, 2011 | 5 | 2011 |
Enhancing re-detection efficacy of defects on blank wafers using stealth fiducial markers MAJ Bouwens, DJ Maas, JCJ van der Donck, PFA Alkemade, ... Microelectronic Engineering 153, 48-54, 2016 | 4 | 2016 |
RapidNano: Towards 20nm Particle Detection on EUV Mask Blanks J van der Donck, P Bussink, E Fritz, P van der Walle | 4 | 2016 |
Nanoparticle detection limits of TNO’s Rapid Nano: modeling and experimental results P van der Walle, P Kumar, D Ityaksov, R Versluis, DJ Maas, O Kievit, ... Photomask technology 2012, 85222Q, 2012 | 4 | 2012 |