Ines Pereyra
Ines Pereyra
Prof. Engenharia Sistemas Eletrônicos, Escola Politecnica, Universidade de São Paulo
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On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films
MI Alayo, I Pereyra, WL Scopel, MCA Fantini
Thin Solid Films 402 (1-2), 154-161, 2002
Thick SiOxNy and SiO2 films obtained by PECVD technique at low temperatures
MI Alayo, I Pereyra, MNP Carreno
Thin Solid Films 332 (1-2), 40-45, 1998
High quality low temperature DPECVD silicon dioxide
I Pereyra, MI Alayo
Journal of Non-Crystalline Solids 212 (2-3), 225-231, 1997
Wide gap a-Si1− xCx: H thin films obtained under starving plasma deposition conditions
I Pereyra, MNP Carreño
Journal of non-crystalline solids 201 (1-2), 110-118, 1996
Study of nitrogen-rich silicon oxynitride films obtained by PECVD
D Criado, I Pereyra, MI Alayo
Materials Characterization 50 (2-3), 167-171, 2003
The influence of “starving plasma” regime on carbon content and bonds in a-Si1− xCx: H thin films
I Pereyra, MNP Carreno, MH Tabacniks, RJ Prado, MCA Fantini
Journal of applied physics 84 (5), 2371-2379, 1998
Study of MOS capacitors with TiO2 and SiO2/TiO2 gate dielectric
KF Albertin, MA Valle, I Pereyra
Journal of Integrated Circuits and Systems 2 (2), 89-93, 2007
National prevalence of larval echinococcosis in sheep in slaughtering plants Ovis aries as an indicator in control programmes in Uruguay
PA Cabrera, P Irabedra, D Orlando, L Rista, G Harán, G Viñals, ...
Acta tropica 85 (2), 281-285, 2003
Wide optical band gap window layers for solar cells
Z Yu, I Pereyra, MNP Carreno
Solar energy materials and solar cells 66 (1-4), 155-162, 2001
Microvoids in diamond‐like amorphous silicon carbide
MNP Carreno, I Pereyra, MCA Fantini, H Takahashi, R Landers
Journal of applied physics 75 (1), 538-542, 1994
On the structural properties of a‐Si1−xCx:H thin films
V Mastelaro, AM Flank, MCA Fantini, DRS Bittencourt, MNP Carreño, ...
Journal of applied physics 79 (3), 1324-1329, 1996
Local structure and bonds of amorphous silicon oxynitride thin films
WL Scopel, MCA Fantini, MI Alayo, I Pereyra
Thin solid films 413 (1-2), 59-64, 2002
Low temperature plasma enhanced chemical vapour deposition boron nitride
MNP Carreno, JP Bottecchia, I Pereyra
Thin Solid Films 308, 219-222, 1997
Amorphous hydrogenated carbon-nitride films prepared by RF-PECVD in methane–nitrogen atmospheres
EF Motta, I Pereyra
Journal of Non-Crystalline Solids 338, 525-529, 2004
PECVD-SiOxNy films for large area self-sustained grids applications
MNP Carreno, MI Alayo, I Pereyra, AT Lopes
Sensors and Actuators A: Physical 100 (2-3), 295-300, 2002
Silicon rich silicon oxynitride films for photoluminescence applications
M Ribeiro, I Pereyra, MI Alayo
Thin Solid Films 426 (1-2), 200-204, 2003
Structural analysis of silicon oxynitride films deposited by PECVD
D Criado, MI Alayo, I Pereyra, MCA Fantini
Materials Science and Engineering: B 112 (2-3), 123-127, 2004
Annealing effects of highly homogeneous a-Si1− xCx: H
RJ Prado, TF D’addio, MCA Fantini, I Pereyra, AM Flank
Journal of non-crystalline solids 330 (1-3), 196-215, 2003
Study of reactive sputtering titanium oxide for metal-oxide-semiconductor capacitors
KF Albertin, I Pereyra
Thin Solid Films 517 (16), 4548-4554, 2009
Crystalline silicon oxycarbide: Is there a native oxide for silicon carbide?
CRS da Silva, JF Justo, I Pereyra
Applied physics letters 84 (24), 4845-4847, 2004
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