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Ines Pereyra
Ines Pereyra
Prof. Engenharia Sistemas Eletrônicos, Escola Politecnica, Universidade de São Paulo
Verified email at lme.usp.br
Title
Cited by
Cited by
Year
On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films
MI Alayo, I Pereyra, WL Scopel, MCA Fantini
Thin Solid Films 402 (1-2), 154-161, 2002
2102002
Thick SiOxNy and SiO2 films obtained by PECVD technique at low temperatures
MI Alayo, I Pereyra, MNP Carreno
Thin Solid Films 332 (1-2), 40-45, 1998
1181998
High quality low temperature DPECVD silicon dioxide
I Pereyra, MI Alayo
Journal of Non-Crystalline Solids 212 (2-3), 225-231, 1997
1001997
Wide gap a-Si1− xCx: H thin films obtained under starving plasma deposition conditions
I Pereyra, MNP Carreño
Journal of non-crystalline solids 201 (1-2), 110-118, 1996
781996
Study of nitrogen-rich silicon oxynitride films obtained by PECVD
D Criado, I Pereyra, MI Alayo
Materials Characterization 50 (2-3), 167-171, 2003
712003
The influence of “starving plasma” regime on carbon content and bonds in a-Si1− xCx: H thin films
I Pereyra, MNP Carreno, MH Tabacniks, RJ Prado, MCA Fantini
Journal of applied physics 84 (5), 2371-2379, 1998
671998
Study of MOS capacitors with TiO2 and SiO2/TiO2 gate dielectric
KF Albertin, MA Valle, I Pereyra
Journal of Integrated Circuits and Systems 2 (2), 89-93, 2007
652007
National prevalence of larval echinococcosis in sheep in slaughtering plants Ovis aries as an indicator in control programmes in Uruguay
PA Cabrera, P Irabedra, D Orlando, L Rista, G Harán, G Viñals, ...
Acta tropica 85 (2), 281-285, 2003
652003
Wide optical band gap window layers for solar cells
Z Yu, I Pereyra, MNP Carreno
Solar energy materials and solar cells 66 (1-4), 155-162, 2001
652001
Microvoids in diamond‐like amorphous silicon carbide
MNP Carreno, I Pereyra, MCA Fantini, H Takahashi, R Landers
Journal of applied physics 75 (1), 538-542, 1994
601994
On the structural properties of a‐Si1−xCx:H thin films
V Mastelaro, AM Flank, MCA Fantini, DRS Bittencourt, MNP Carreño, ...
Journal of applied physics 79 (3), 1324-1329, 1996
591996
Local structure and bonds of amorphous silicon oxynitride thin films
WL Scopel, MCA Fantini, MI Alayo, I Pereyra
Thin solid films 413 (1-2), 59-64, 2002
572002
Low temperature plasma enhanced chemical vapour deposition boron nitride
MNP Carreno, JP Bottecchia, I Pereyra
Thin Solid Films 308, 219-222, 1997
561997
Amorphous hydrogenated carbon-nitride films prepared by RF-PECVD in methane–nitrogen atmospheres
EF Motta, I Pereyra
Journal of Non-Crystalline Solids 338, 525-529, 2004
552004
PECVD-SiOxNy films for large area self-sustained grids applications
MNP Carreno, MI Alayo, I Pereyra, AT Lopes
Sensors and Actuators A: Physical 100 (2-3), 295-300, 2002
452002
Silicon rich silicon oxynitride films for photoluminescence applications
M Ribeiro, I Pereyra, MI Alayo
Thin Solid Films 426 (1-2), 200-204, 2003
442003
Structural analysis of silicon oxynitride films deposited by PECVD
D Criado, MI Alayo, I Pereyra, MCA Fantini
Materials Science and Engineering: B 112 (2-3), 123-127, 2004
422004
Annealing effects of highly homogeneous a-Si1− xCx: H
RJ Prado, TF D’addio, MCA Fantini, I Pereyra, AM Flank
Journal of non-crystalline solids 330 (1-3), 196-215, 2003
382003
Study of reactive sputtering titanium oxide for metal-oxide-semiconductor capacitors
KF Albertin, I Pereyra
Thin Solid Films 517 (16), 4548-4554, 2009
372009
Crystalline silicon oxycarbide: Is there a native oxide for silicon carbide?
CRS da Silva, JF Justo, I Pereyra
Applied physics letters 84 (24), 4845-4847, 2004
352004
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