| Ceramic coating comprising yttrium which is resistant to a reducing plasma JY Sun, X He, KS Collins, T Graves, S Thach, J Yuan, L Xu, RG Duan US Patent App. 12/072,530, 2009 | 479 | 2009 |
| Plasma-resistant ceramics with controlled electrical resistivity JY Sun, KS Collins, RG Duan, S Thach, T Graves, X He, J Yuan US Patent 8,367,227, 2013 | 472 | 2013 |
| Yttria-based material coated chemical vapor deposition chamber heater RG Duan, JC Rocha-Alvarez, J Zhou US Patent 9,556,507, 2017 | 467 | 2017 |
| Gas distribution showerhead with coating material for semiconductor processing J Sun, S Thach, RG Duan, T Graves US Patent App. 13/011,839, 2011 | 443 | 2011 |
| Erosion-resistant plasma chamber components comprising a metal base structure with an overlying thermal oxidation coating JY Sun, L Xu, KS Collins, T Graves, RG Duan, S Thach US Patent 8,129,029, 2012 | 422 | 2012 |
| Synthesis, crystallization mechanism, and catalytic properties of titanium-rich TS-1 free of extraframework titanium species W Fan, RG Duan, T Yokoi, P Wu, Y Kubota, T Tatsumi Journal of the American Chemical Society 130 (31), 10150-10164, 2008 | 371 | 2008 |
| Method and apparatus for removing polymer from a substrate K Collins, M Salinas, W Merry, J Yuan, A Nguyen, K Ramaswamy, J Sun, ... US Patent App. 12/395,057, 2009 | 283 | 2009 |
| Thermal treated sandwich structure layer to improve adhesive strength RG Duan, JC ROCHA-ALVAREZ US Patent App. 14/106,604, 2014 | 274 | 2014 |
| Chamber coatings RG Duan, JC Rocha-Alvarez, J Zhou, N Liu, Y Chen, AB Mallick, ... US Patent 9,384,950, 2016 | 271 | 2016 |
| Protective coatings resistant to reactive plasma processing JY Sun, RG Duan, KS Collins US Patent 9,017,765, 2015 | 271 | 2015 |
| Plasma resistant ceramic coated conductive article JY Sun, BP Kanungo, RG Duan, H Noorbakhsh, J Yuh, D Lubomirsky US Patent 9,394,615, 2016 | 225 | 2016 |
| Corrosion-resistant bonding agents for bonding ceramic components which are exposed to plasmas JY Sun, RG Duan, KS Collins US Patent 8,858,745, 2014 | 216 | 2014 |
| Method of coating semiconductor processing apparatus with protective yttrium-containing coatings JY Sun, S Thach, J Dempster, L Xu, KS Collins, RG Duan, T Graves, X He, ... | 169 | 2009 |
| Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas JY Sun, RG Duan, J Yuan, L Xu, KS Collins US Patent 7,696,117, 2010 | 153 | 2010 |
| Spark plasma sintering of silicon nitride/silicon carbide nanocomposites with reduced additive amounts J Wan, RG Duan, AK Mukherjee Scripta Materialia 53 (6), 663-667, 2005 | 137 | 2005 |
| Ceramic article with reduced surface defect density and process for producing a ceramic article RG Duan, T Lill, JY Sun, B Schwarz US Patent 9,034,199, 2015 | 102 | 2015 |
| Method of reducing the erosion rate of semiconductor processing apparatus exposed to halogen-containing plasmas JY Sun, RG Duan, J Yuan, L Xu, KS Collins US Patent App. 11/796,210, 2008 | 99 | 2008 |
| Semiconductor processing apparatus which is formed from yttrium oxide and zirconium oxide to produce a solid solution ceramic apparatus JY Sun, RG Duan, J Yuan, L Xu, KS Collins US Patent 8,034,734, 2011 | 90 | 2011 |
| Electrostatic chuck and showerhead with enhanced thermal properties and methods of making thereof J Sun, S Banda, RG Duan US Patent 8,916,021, 2014 | 88 | 2014 |
| Semiconductor processing apparatus comprising a coating formed from a solid solution of yttrium oxide and zirconium oxide JY Sun, RG Duan, J Yuan, L Xu, KS Collins US Patent 8,623,527, 2014 | 86 | 2014 |
