Ionized physical vapor deposition (IPVD): A review of technology and applications U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ...
Thin solid films 513 (1-2), 1-24, 2006
1325 2006 High power impulse magnetron sputtering discharge JT Gudmundsson, N Brenning, D Lundin, U Helmersson
Journal of Vacuum Science & Technology A 30 (3), 2012
736 2012 On the film density using high power impulse magnetron sputtering M Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ...
Surface and Coatings Technology 205 (2), 591-596, 2010
444 2010 The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ...
Thin Solid Films 515 (4), 1522-1526, 2006
375 2006 Physics and technology of magnetron sputtering discharges JT Gudmundsson
Plasma Sources Science and Technology 29 (11), 113001, 2020
318 2020 Oxygen discharges diluted with argon: dissociation processes JT Gudmundsson, EG Thorsteinsson
Plasma Sources Science and Technology 16 (2), 399, 2007
311 2007 Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces J Alami, PO Persson, D Music, JT Gudmundsson, J Bohlmark, ...
Journal of Vacuum Science & Technology A 23 (2), 278-280, 2005
299 2005 Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson
Surface and Coatings Technology 161 (2-3), 249-256, 2002
274 2002 Electronegativity of low-pressure high-density oxygen discharges JT Gudmundsson, IG Kouznetsov, KK Patel, MA Lieberman
Journal of Physics D: Applied Physics 34 (7), 1100, 2001
245 2001 The low pressure Cl /O discharge and the role of ClO EGTJT Gudmundsson
Plasma Sources Science and Technology 19 (5), 055008, 2010
232 * 2010 On the effect of the electron energy distribution on the plasma parameters of an argon discharge: a global (volume-averaged) model study JT Gudmundsson
Plasma Sources Science and Technology 10 (1), 76, 2001
196 2001 Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson
Applied Physics Letters 78 (22), 3427-3429, 2001
180 2001 Variable sensitivity of plant communities in Iceland to experimental warming IS Jónsdóttir, B Magnusson, J Gudmundsson, A Elmarsdottir, H Hjartarson
Global Change Biology 11 (4), 553-563, 2005
174 2005 Organic carbon in Icelandic Andosols: geographical variation and impact of erosion H Óskarsson, Ó Arnalds, J Gudmundsson, G Gudbergsson
Catena 56 (1-3), 225-238, 2004
163 2004 Improved volume-averaged model for steady and pulsed-power electronegative discharges S Kim, MA Lieberman, AJ Lichtenberg, JT Gudmundsson
Journal of Vacuum Science & Technology A 24 (6), 2025-2040, 2006
152 2006 Spatial electron density distribution in a high-power pulsed magnetron discharge J Bohlmark, JT Gudmundsson, J Alami, M Latteman, U Helmersson
IEEE Transactions on Plasma Science 33 (2), 346-347, 2005
149 2005 Experimental studies of O2/Ar plasma in a planar inductive discharge JT Gudmundsson, T Kimura, MA Lieberman
Plasma Sources Science and Technology 8 (1), 22, 1999
144 1999 The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool JT Gudmundsson
Vacuum 84 (12), 1360-1364, 2010
138 2010 Plasma dynamics in a highly ionized pulsed magnetron discharge J Alami, JT Gudmundsson, J Bohlmark, J Birch, U Helmersson
Plasma Sources Science and Technology 14 (3), 525, 2005
135 2005 Recombination and detachment in oxygen discharges: the role of metastable oxygen molecules JT Gudmundsson
Journal of Physics D: Applied Physics 37 (15), 2073, 2004
121 2004