| UV assisted silylation for recovery and pore sealing of damaged low K films BO Xie, AT Demos, KS Yim, T Nowak, K Chan US Patent 8,492,170, 2013 | 433 | 2013 |
| Method and hardware for cleaning UV chambers S Baluja, AT Demos, K Chan, JC Rocha-Alvarez, SA Hendrickson, ... US Patent 9,364,871, 2016 | 353 | 2016 |
| Method for seasoning uv chamber optical components to avoid degradation S Baluja, AT Demos, BO Xie, JC Rocha-Alvarez US Patent App. 13/719,047, 2013 | 238 | 2013 |
| Silylation of porous methylsilsesquioxane films in supercritical carbon dioxide B Xie, AJ Muscat Microelectronic Engineering 76 (1-4), 52-59, 2004 | 74 | 2004 |
| Removal of copper from silicon surfaces using hexafluoroacetylacetone (hfacH) dissolved in supercritical carbon dioxide B Xie, CC Finstad, AJ Muscat Chemistry of materials 17 (7), 1753-1764, 2005 | 47 | 2005 |
| The restoration of porous methylsilsesquioxane (p-MSQ) films using trimethylhalosilanes dissolved in supercritical carbon dioxide B Xie, AJ Muscat Microelectronic engineering 82 (3-4), 434-440, 2005 | 28 | 2005 |
| Microelectronic structure including a low k dielectric and a method of controlling carbon distribution in the structure BO Xie, AT Demos, D Raj, S Ngo, KS Yim US Patent 8,349,746, 2013 | 25 | 2013 |
| Repair and capping of porous MSQ films using chlorosilanes and supercritical CO2 B Xie, L Choate, AJ Muscat Microelectronic Engineering 80, 349-352, 2005 | 24 | 2005 |
| Condensation of silanol groups in porous methylsilsesquioxane films using Supercritical CO/sub 2/and alcohol cosolvents B Xie, AJ Muscat IEEE transactions on semiconductor manufacturing 17 (4), 544-553, 2004 | 24 | 2004 |
| Native oxide removal from SiGe using mixtures of HF and water delivered by aqueous, gas, and supercritical CO2 processes B Xie, G Montaño-Miranda, CC Finstad, AJ Muscat Materials science in semiconductor processing 8 (1-3), 231-237, 2005 | 14 | 2005 |
| Repair of porous methylsilsesquioxane films using supercritical carbon dioxide B Xie, AJ Muscat MRS Online Proceedings Library (OPL) 812, F1. 4, 2004 | 12 | 2004 |
| Method for UV based silylation chamber clean BO Xie, AT Demos, SA Hendrickson, S Baluja, JC Rocha-Alvarez US Patent 8,657,961, 2014 | 10 | 2014 |
| WATER REMOVAL AND REPAIR OF POROUS ULTRA LOW-k FILMS USING SUPERCRITICAL CO₂ B Xie, AJ Muscat Cleaning Technology in Semiconductor Device Manufacturing...: Proceedings of …, 2003 | 10 | 2003 |
| Dielectric recovery of plasma damaged low-k films by UV-assisted photochemical deposition KS Yim, T Nowak, BO Xie, AT Demos US Patent 8,216,861, 2012 | 9 | 2012 |
| Pesticide extraction studies using supercritical carbon dioxide WS Zimmt, N Odegaard, TK Moreno, RA Turner, MR Riley, B Xie, ... Smithsonian Contributions to Museum Conservation, 2010 | 8 | 2010 |
| Methods and apparatus for cleaning a substrate W Lu, J Tang, A Ko, N Yee, BO Xie, J Lee, R Endo US Patent App. 11/690,621, 2007 | 8 | 2007 |
| Method and hardware for cleaning UV chambers S Baluja, AT Demos, K Chan, JC Rocha-Alvarez, SA Hendrickson, ... US Patent 9,506,145, 2016 | 6 | 2016 |
| UV-assisted photochemical vapor deposition for damaged low K films pore sealing BO Xie, K Chan, AT Demos US Patent 9,058,980, 2015 | 6 | 2015 |
| Frontside structure damage protected megasonics clean Z Li, J Tang, BO Xie, W Lu US Patent 7,682,457, 2010 | 6 | 2010 |
| Methods and apparatus for cleaning a substrate W Lu, J Tang, A Ko, N Yee, BO Xie, J Lee, R Endo US Patent App. 11/690,628, 2007 | 6 | 2007 |
